Obsesif kompulsif bozukluk olan olgularda dinamik tiyol/disülfit dengesi ve oksidatif metabolizmanın değerlendirilmesi
Küçük Resim Yok
Tarih
2021
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
İnönü Üniversitesi
Erişim Hakkı
info:eu-repo/semantics/openAccess
Özet
Amaç: Obsesif Kompulsif Bozukluk (OKB) patofizyolojisi tam olarak aydınlatılamamış olmakla birlikte genetik yatkınlık ve nörobiyolojik etkenlerin etyolojide rol alabileceği düşünülmektedir. Bu biolojik etkenlerden biri de oksidatif stres hasarıdır. Biz bu çalışmada OKB'li hasta ve kontrollerde plazma ve eritrosit içindeki bazı oksidan parametreleri karşılaştırarak daha bütüncül bir değerlendirilmeyi amaçladık. Gereç ve Yöntem: Çalışmaya DSM-V'e göre OKB tanısı almış 47 hasta ve 49 sağlıklı gönüllü dahil edildi. Tüm katılımcılara sosyodemografik veri formu, klinik global izlem ölçeği, Yale Brown obsesyon kompulsiyon ölçeği dolduruldu. Total Antioksidan Seviyesi (TAS), Total Oksidan Seviyesi (TOS) ölçümleri hem plazma hem eritrosit içide, Malondialdehid (MDA), Tiyol/Disülfit ölçümleri ise sadece plazmada yapıldı. Bulgular: Çalışmaya alınan hastalar ve kontrol grubu plazma TAS, TOS, OSİ ve MDA değerleri açısından karşılaştırıldığında istatistiksel olarak anlamlı fark gözlenemedi. Ancak hasta grubunda TAS-ERİTROSİT düzeyleri sağlam kontrollere göre düşük (p<0.05), OSI-ERİTROSİT düzeyleri ise yüksekti(p<0.05). Hasta grubunda PLAZMA TOTAL TİYOL düzeylerinde sağlam kontrollere göre bir değişiklik gözlenmezken, PLAZMA-NATİVE TİYOL düzeyleri anlamlı derecede daha yüksekti(p<0.001). Hasta grubunun PLAZMA-DİSÜLFİT düzeyleri ise anlamlı derecede daha düşüktü(p<0.05). Sonuçlar: OKB hastalarında TAS TOS plazma değerleri değişmezken, Native Tiyol değerlerinin yüksek olması ve eritrosit içindeki TAS düzeyi düşük olması bu alanda literatüre katkı sağlayacak yeni bulgulardır. Plazmada Native Tiyol'ün artmış olması OKB hastalarında eritrosit içinde azalan antioksidan kapasiteyi kompanse etme çabası olarak düşünülebilir. Gelecekte yapılacak çalışmalarda, OKB gibi psikiyatrik hastalıklarda, oksidatif stres parametrelerinin tiyol/disulfit parametrelerini de içerecek şekilde hem plazma hem de eritrosit içinde değerlendirilmesinin daha sağlıklı sonuçlar vereceğini düşünmekteyiz. Anahtar kelimeler: Obsesif Kompulsif Bozukluk, oksidatif stres, tiyol, disülfid, tiyol/disülfid dengesi
Objective: Although the pathophysiology of Obsessive Compulsive Disorder (OCD) has not been fully elucidated, it is thought that genetic predisposition and neurobiological factors may play a role in the etiology. One of these biological factors is oxidative stress damage. In this study, we aimed to evaluate this area by comparing some of oxidant parameters in plasma and erythrocytes of OCD patients and controls. Materials and Methods: In the study,47 patients diagnosed with OCD according to DSM-V and 49 Healthy volunteers were included .Sociodemographic data form, clinical global follow-up scale, and Yale Brown obsession-compulsion scale were filled in for all participants. Total Antioxidant Status (TAS), Total Oxidant Status (TOS) were measured in both plasma and erythrocyte, while Malondialdehyde (MDA) and Plasma Thiol/Disulfide measurements were made only in plasma. Results: When the patients included in the study and the control group were compared in terms of plasma TAS, TOS, OSI and MDA values, no statistically significant difference was observed. However, TAS-ERYTHROCYTE levels were lower (p<0.05) and OSI-ERYTHROCYTE levels were higher in the patient group (p<0.05) compared to the healthy controls. While no change was observed in PLASMA TOTAL THIOL levels in the patient group compared to healthy controls, they were significantly higher in terms of PLASMA-NATIVE THIOLE levels (p<0.001). Plasma-DISULFIDE levels of the patients group however,were significantly lower (p<0.05). Conclusions: While TAS TOS plasma values do not change in OCD patients compared to controls, high plasma Native Thiol values and low TAS levels in erythrocytes are new findings that will contribute to the literature in this area.The increase in Native Thiol, an antioxidant molecule in the plasma, can be considered as an effort to compensate for the decreased antioxidant capacity in the erythrocyte in OCD patients. In the light of these results, we think that the evaluation of oxidative stress parameters in both plasma and erythrocyte in psychiatric diseases such as OCD and the measurement of these parameters not only in plasma but also in erythrocyte will give healthier results.The results of our study showed that the dynamic thiol/disulfide balance in OCD patients was in the direction of thiol formation, suggesting an antioxidative reaction. More studies are needed to use thiol/disulfide balance parameters as a diagnostic biomarker in OCD. Keywords: Obsessive Compulsive Disorder, oxidative stress, thiol, disulfide, thiol/disulfide balance
Objective: Although the pathophysiology of Obsessive Compulsive Disorder (OCD) has not been fully elucidated, it is thought that genetic predisposition and neurobiological factors may play a role in the etiology. One of these biological factors is oxidative stress damage. In this study, we aimed to evaluate this area by comparing some of oxidant parameters in plasma and erythrocytes of OCD patients and controls. Materials and Methods: In the study,47 patients diagnosed with OCD according to DSM-V and 49 Healthy volunteers were included .Sociodemographic data form, clinical global follow-up scale, and Yale Brown obsession-compulsion scale were filled in for all participants. Total Antioxidant Status (TAS), Total Oxidant Status (TOS) were measured in both plasma and erythrocyte, while Malondialdehyde (MDA) and Plasma Thiol/Disulfide measurements were made only in plasma. Results: When the patients included in the study and the control group were compared in terms of plasma TAS, TOS, OSI and MDA values, no statistically significant difference was observed. However, TAS-ERYTHROCYTE levels were lower (p<0.05) and OSI-ERYTHROCYTE levels were higher in the patient group (p<0.05) compared to the healthy controls. While no change was observed in PLASMA TOTAL THIOL levels in the patient group compared to healthy controls, they were significantly higher in terms of PLASMA-NATIVE THIOLE levels (p<0.001). Plasma-DISULFIDE levels of the patients group however,were significantly lower (p<0.05). Conclusions: While TAS TOS plasma values do not change in OCD patients compared to controls, high plasma Native Thiol values and low TAS levels in erythrocytes are new findings that will contribute to the literature in this area.The increase in Native Thiol, an antioxidant molecule in the plasma, can be considered as an effort to compensate for the decreased antioxidant capacity in the erythrocyte in OCD patients. In the light of these results, we think that the evaluation of oxidative stress parameters in both plasma and erythrocyte in psychiatric diseases such as OCD and the measurement of these parameters not only in plasma but also in erythrocyte will give healthier results.The results of our study showed that the dynamic thiol/disulfide balance in OCD patients was in the direction of thiol formation, suggesting an antioxidative reaction. More studies are needed to use thiol/disulfide balance parameters as a diagnostic biomarker in OCD. Keywords: Obsessive Compulsive Disorder, oxidative stress, thiol, disulfide, thiol/disulfide balance
Açıklama
Anahtar Kelimeler
Psikiyatri, Psychiatry
